Go to Document#: Search by Keyword: Browse By: Document # Date Model Product Type Author VSEA7025 08/08/2007 SI Japan Article July 2007 - Advantages of Dual Magnet Ribbon Beam Architecture for Particle Control in Single Wafer High Current Implant Author: C. Campbell.G. Redinbo.J. Blake.P. Kellerman.E. Moore.N. Variam.Y. Katsuragi And N. Sakumoto Implanter Types: VIISta HC VSEA7024 07/31/2007 Solid State Article July 2007 - Precision Requirements for Advanced High Performance Logic Implantation Author: Hans Gossman.Greg Redinbo.Yuri Erokhin.Terry Romig.Kim Elshot.Jiejie Xu And Jennifer Mccomb Implanter Types: VIISta HC VSEA7023 11/30/2006 Using Multiple Implant Regions To Reduce Development Wafer Usage Author: S. R. Walther.S. Falk.S. Mehta.Y. Erokhin.And P. Nunan Implanter Types: All VIISta Models VSEA7022 11/30/2006 Process Transferability from a Spot Beam to a Ribbon Beam Implanter: CMOS Device Matching Author: Vincent Kaeppelin.Zdenek Chalupa.Laurent Frioulaud.Sandeep Mehta.Baonian Guo.Kyu-Ha Shim.Horst Lendzian And Yuri Erokhin Implanter Types: VIISta 80 VSEA7021 11/30/2006 Process Control in Production-Worthy Plasma Doping Technology Author: Edmund J. Winder.Ziwei Fang.Edwin Arevalo.Tim Miller.Harold Persing.Vikram Singh.And T.M. Parrill Implanter Types: P2Lad VSEA7020 11/30/2006 Plasma Doping For P+ Junction Formation In 90 nm NOR Flash Memory Technology Author: Dario Bigarella.Valter Soncini.Deven Raj.Vikram Singh.Steve Walther Implanter Types: P2Lad VSEA7019 11/30/2006 Optimized Autotuning for Single Wafer High-Current and Medium-Current Implanters Author: J.T. Scheuer.A. Cucchetti.M. Welsch.W. Callahan.K. Luey.And J.C. Olson Implanter Types: VIISta 80, VIISta 810 VSEA7018 11/30/2006 Next Generation Medium Current Product: VIISta 900XP Author: A. Renau Implanter Types: VIISta 900XP VSEA7017 11/30/2006 Metrology Requirements For Single Wafer Ion Implanters Author: Joseph C. Olson.Gordon Angel.Atul Gupta.Rosario Mollica.Daniel Distaso.Jinning Liu Implanter Types: All Models VSEA7016 11/30/2006 Maximizing Productivity for Well Implantation Author: Qing Zhai.Youn Ki Kim.Dennis Rodier.And Naushad Variam Implanter Types: VIISta 3000, VIISta 810 VSEA7015 11/30/2006 Indium Performance on the V810 Author: Russell J. Low & Qing Zhai Implanter Types: VIISta 810 VSEA7014 11/30/2006 Improved Ion Beam Incident Angle Control for Varian E220 and E500 Implanters Author: David Hendrix.Zhiyong Zhao.Reuel Liebert.Ken Gifford And Pierre Mitchell Implanter Types: E220/E500 VSEA7013 11/30/2006 Impact of Dose Rate Effects and Damage Engineering on Device Performance Author: Kyuha Shim.Yeonsang Hwang.Yongseung Lee.Jungsoo An.Seonho Ryu.Seungho Hahn.Changjune Cho.Namhae Hur.Baonian Guo.Jinning Liu.Yuri.Erokhin Implanter Types: All Models VSEA7012 11/30/2006 High Current Implant Precision Requirements for Sub-65 nm Logic Devices Author: Yuri Erokhin.Terry Romig.Elshot Kim.Jiejie Xu.Baonian Guo.Jinnig Liu.Kyu-Ha.Shim And Peter Nunan Implanter Types: VIISta 80 VSEA7011 11/30/2006 Enhanced Dosimetry For Single Wafer High-Current Implanters Author: J.T. Scheuer.J. Dzengeleski.D. Distaso.D. Timberlake.J. Cummings.And J.C. Olson Implanter Types: VIISta 80 VSEA7010 11/30/2006 Efficient High Current Process Transfer and Device Matching Strategies for sub-90nm Manufacturing Author: Dennis Lee.Nyensiong Loh.Miow Chin Tan.Kyuha Shim.Scott Falk.Baonian Guo.Scott Jillson.Bryan Wong.Kherchong Loh.Sandeep Mehta.Yuri Erokhin Implanter Types: VIISta 80 VSEA7009 11/30/2006 Defect Behavior in BF2 Implants For S/D Applications as a Function of Ion Beam Characteristics Author: Nathalie Cagnat.Cyrille Laviron.Nicolas Auriac.Jinning Liu.Sandeep.Mehta.Laurent Frioulaud & Daniel Mathiot Implanter Types: VIISta 80 VSEA7008 11/30/2006 Characterization of B2H6 Plasma Doping for Converted p+ Poly-Si Gate Author: Jae-Geun Oh.J.K. Lee.S.H. Hwang.H.J. Cho.Ys Sohn.D.S. Sheen.Sh Pyi.S.W. Lee.S.H. Hahn.Y.B. Jeon.Z. Fang And V. Singh Implanter Types: P2Lad VSEA7007 11/30/2006 Backing up Medium Current Implanters using Single Wafer High Energy Implanter for Manufacturing Efficiency Author: H.L. Sun.Woojin Lee.And Knight Xu.Hy Tsun.Kt Peng.Ls Juang.And Hp Tseng Implanter Types: VIISta 3000, VIISta 810 VSEA7006 11/30/2006 B2H6 PLAD Doped PMOS Device Performance Author: Z. Fang.T. Miller.E. Winder.H. Persing.E. Arevalo.A. Gupta.T. Parrill.And V. Singh Implanter Types: P2Lad VSEA7005 11/30/2006 Advanced Single Wafer High Current Beamline Architecture for Sub-65nm Author: G. Redinbo.C. Campbell.J. Mullin Implanter Types: VIISta 80 VSEA7004 11/30/2006 Advantages of Dual Magnet Ribbon Beam Architecture for Particle Control in Single Wafer High Current Implant Author: C. Campbell.G. Redinbo.J. Blake.P. Kellerman.E. Moore And N. Variam Implanter Types: VIISta 80 VSEA7003 11/30/2006 APC Implementation on VIISta Ion Implanters Author: Youn Ki Kim.Bret Adams.Nick Parisi.Sandeep Mehta.Jim Hamilton Implanter Types: All VIISta Models VSEA7002 11/30/2006 Advanced Charge Control for Single Wafer Implanters Author: P. F. Kurunczi.A. S. Perel.E. Wright.S. Kikuchi.And J. T. Scheuer Implanter Types: All Models VSEA7001 11/30/2006 Advanced Modeling Techniques for Analysis of High Current Ribbon Beam Transport and Control Author: P. Kellerman And F. Sinclair Implanter Types: VIISta 80 VSEA70 01/11/2005 Modeling of Motion Control Systems Used in an Ion Implanter Author: W.S. Chang.Dennis Rodier.Paul Murphy.Sean Lu Implanter Types: All Models VSEA7 11/01/2002 Requirements and Challenges in Ion Implanters for Sub-100nm CMOS Device Fabrication Author: Ukyo Jeong.Baonian Guo.Gongchuan Li.Sandeep Mehta.Z. Zhao Implanter Types: VSEA6 12/15/2002 Formation of Ultrashallow Junctions in 500EV Boron Implanted Silicon Using NonMelt Laser Annealing Author: Dan Downey.Edwin Arevalo.S. Earles.J. Frazer.M. Law.K. Jones.S. Talwar Implanter Types: VSEA5 01/14/2002 Advanced Annealing for Sub-130nm Junction Formation Author: Dan Downey.Edwin Arevalo.J. Gelpey.K. Elliott.D. Camm.S. Mccoy.J. Ross Implanter Types: VSEA4 11/04/2002 Channeling Doping Profiles Studies for Small Incident Angle Implantation into Silicon Wafers Author: Baonian Guo.Naushad Variam.Ukyo Jeong.Sandeep Mehta.M .Posselt.A. Lebedev Implanter Types: All Rights Reserved © 2005 Varian Semiconductor Equipment Associates, Inc. Privacy Policy