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VIISta® High Current
Varian Semiconductor is the leader in high current ion implanters, shipping more single-wafer high current systems than all other competitors combined.

The VIISta High Current series feature:
  • Dual-magnet, ribbon beam architecture with a demonstrated 2X improvement in particle performance vs. other companies’ high current tools
  • The patented Closed-Loop Varian Positioning System (VPStm ) delivers accurate and repeatable incident beam angle control
Our high current implanters offer:
  • Highest productivity on a production-proven single-wafer architecture and highest overall productivity of any ion implanter in the industry
  • Best particle performance
  • Production-proven results from leading-edge memory, logic, and foundry manufacturers worldwide
Our high current implanters are based on a common platform, providing customers with flexibility in managing overall bay productivity, resulting in:
  • Decreased time to first silicon
  • Greater productivity across all applications
  • Highest industry throughput
  • Precise beam steering and tilt accuracy
  • Flexible product mix changes
  • Cost-effective training
  • Increased return on investment



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